Improving on product overlay is one of the key challenges when shrinking technology nodes in semiconductor manufacturing. . . . With smart placement of alignment mark pairs in the X and Y direction, ...
An optical method for mask alignment in double-sided lithography has been developed by a team at the University of Hagen in Germany (Appl. Opt. 40 5052). The technique, which is based on the ...
This week Nikon has announced the launch of its new FPD Lithography System FX-6AS supporting small and medium-size panels. Nick on has created the latest FPD lithography system for manufacturing high ...
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