TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.
YOKOHAMA—After a decade of development, Canon Inc. began selling lithography equipment for semiconductor production, hoping to reclaim a share in the market. The equipment is used to print fine ...
To build optoelectronic circuits, researchers need to make films of semiconductor nanocrystals in desired patterns, just as they can with conventional silicon-based electronics. But the techniques ...
SAN JOSE, Calif. — Lam Research Corp. has rolled out the 2300 Motif, a post-lithography pattern enhancement system. Based on a proprietary plasma-assisted process, the new system delivers ...
A new startup has emerged and unveiled a technology that addresses one of the bigger but less understood problems in advanced lithography–pattern roughness. The startup, called Fractilia, is a ...
(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...
Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...
2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
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